Vasily Andreev Postdoctoral Student Saint Petersburg State University, Russia Ph.D. Chemistry, 2006 Thesis Advisor: Prof. A.I. Victorov Dissertation: Modeling of formation, growth and branching of micelles in solutions of ionic surfactants. M.S. Chemistry, 2002 Research Interest: Molecular and statistical thermodynamics of complex fluids. Electrostatic interactions in colloidal systems. Molecular thermodynamics of morphological transitions in micellar systems. Kinetics of escape of particles from surfaces.	andreev@berkeley.edu
Project Title: Removal of particulate contaminations from silicon wafers Project Summary: Conventional metal-oxide-semiconductor manufacture of microelectronic devices can require over a hundred process steps entailing deposition, removal, and alteration of material. For each step, processing, handling, and transport of the silicon wafers generates or transfers particulate contamination that can adversely affect device performance. The impact of particulate contamination can be drastic, significantly diminishing device yield; the trend toward smaller etch features exacerbates the problem as a single 100-nm contaminant particle can render a chip inoperative. Accordingly, an entire sub-industry, focused on cleaning, has emerged to remove particulate contamination. In this project we study theoretically the mechanism of contaminant particulate removal from smooth silicon wafers using gas-bubble and solids suspensions.